Usually, a further two exposures are taken at half-wave plate positions
of 45 degrees and 67.5 degrees (referred to here as exposures
and
). These provide some redundancy in the data and enable
internal consistency checks to be made during the data reduction stage.
These exposures are denoted by the letter
to indicate that they are
target exposures. In addition to these target exposures, some flat-field exposures are also required. These are used to correct for
any spatial variation in the sensitivity of the system, and consist of
exposures of a photometrically flat surface. Ideally, the flat-field
source should be unpolarized. However, if the additional target exposures
and
are taken, then a spatially constant polarization
across the flat-field source can be corrected for during data reduction.
Since the polarization of the flat-field surface is rarely known to be
zero, these additional target exposures should always be taken.
It is important that the flat-field has a good signal-to-noise ratio.
For this reason, it is common practice to take one or more flat-field
exposures at each half-wave plate position, and stack them together into a
single master flat-field (although it is not strictly necessary to use
different half-wave plate positions). Further discussion of the flat-fielding
procedure is given here.
POLPACK